COURSE OUTLINE:

Tentative Schedule

I.

Fundamentals of Semiconductor Processing

(A)

Conductors

(B)

Insulators

(C)

Semiconductors

(D)

Resistance

(E)

Resistivity

(F)

Conductivity

(G)

Uses of semiconductors

II.

 Semiconductor Doping

(A)

Effects of dopants

(B)

Problems

III.

Crystal Growth

(A)

Techniques

(B)

Problems

(C)

Crystallography

IV.

Epitaxial Growth

(A)

Techniques

(B)

Problems

(C)

Growth

V.

Diffusion

(A)

Techniques

(B)

Problems

(C)

Time dependence

VI.

Oxidation

(A)

Theory

(B)

Techniques

VII.

Crystal Defects

(A)

Surface damage

(B)

Carbide, nitride, and melting

VIII

Cleaning Techniques

(A)

Etching silicon

(B)

Si02

IX.

Masking

(A)

Procedures

(B)

Problems

X.

Photoresist Processing

(A)

Procedures

(B)

Problems

XI.

Metalization

(A)

Techniques

(B)

Problems

XII.

Vapor Deposition

(A)

Techniques

(B)

Problems